During the semiconductor manufacturing process, it is inevitable to produce pollutants such as particles, organic matter, natural oxide layers, and metal impurities. A cleaning machine refers to a process equipment that performs non-destructive cleaning on the wafer surface to remove impurities and obtain the desired clean surface, preparing good conditions for the next step of the process. Cleaning machines are widely used in various stages of integrated circuit manufacturing, including pre/post film cleaning, plasma etching cleaning, ion implantation cleaning, chemical mechanical polishing cleaning, and metal deposition cleaning. Cleaning technology is one of the important factors affecting chip yield....